Nguồn RF Plasma

High-Power Density for Compact Installation
Unparalleled Breadth of RF-Application Delivery without Custom Lead Times
Asymmetric Bias Waveform Generator for Direct Control of Substrate Voltage and Ion Energy
A Compact, Economical, Easy to Install, Low Power RF Platform
Economical, Mid-Frequency Generator Tailored for Plasma Processing
Industry-Leading, Repeatable Power Delivery for Core Plasma Applications
Compact, Cost-Effective Integrated Generator and Solid-State Matching RF Power Delivery System
Multi-Level Pulsing and Pulse Waveform Control for Emerging Plasma Applications

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Multi-Level Pulsing and Pulse Waveform Control for Emerging Plasma Applications
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